N & K Technology

N & K Technology is a leading provider of optical metrology systems for various technological manufacturing needs. Their field-proven systems monitor critical processing steps, offering experimental data with the highest signal-to-noise ratio over the widest wavelength range in the industry, leading to higher yields. With their patented technology based on the Forouhi-Bloomer dispersion equations, N & K Technology enables the monitoring of challenging current and next-generation IC processes.

With a focus on thin film and trench OCD applications, N & K Technology's systems accurately determine thicknesses, n and k spectra, and energy band gap of ultra-thin and ultra-thick films, as well as depth, CD, and profile of complex IC structures. Their core technology utilizes DUV-Vis-NIR or IR broadband reflectance and transmittance, combined with rigorous analysis, to achieve optimal measurement accuracy. Trusted by industry professionals, N & K Technology's yield-enhancing, production-worthy, and field-proven metrology tools have been installed in high volume production fabs and foundries worldwide for over two decades.

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